reg ASSURA RCX settings

Dear all
I have the following query in running an ASSURA RCX. In the "Setup" tab of the ASSURA RCX, we have an option for specifying "Extract MOS Diffusion AP". What does setting up of this parameter physically imply in an extraction ?. Any advice on this ?.
* My understanding is it sets up the AS, AD, PS, PD parameters that we use in SPICE syntax.

Note:
I checked the 'ASSURA Physical verification user guide', but they had missed this in the manual. [The MOS diffusion extraction resistance was specified twice, I guess]

Regards
Lokesh

 

[Andrew Beckett]

On 04/08/13 15:09, lokeshraje@gmail.com wrote:

Dear all
I have the following query in running an ASSURA RCX. In the "Setup"
tab of the ASSURA RCX, we have an option for specifying "Extract MOS
Diffusion AP". What does setting up of this parameter physically imply
in an extraction ?. Any advice on this ?.
* My understanding is it sets up the AS, AD, PS, PD parameters that
we use in SPICE syntax.

Note: I checked the 'ASSURA Physical verification user guide', but
they had
missed this in the manual. [The MOS diffusion extraction resistance was
specified twice, I guess]
Regards
Lokesh

Lokesh,

These options are obsolete. In general, such device measurements should
be done as part of the LVS device extraction, rather than being
performed by the parasitic extraction tool.

They're there for legacy flows - in the QRC documentation, it explicitly
says that the corresponding QRC commands are no longer supported.

Regards,

Andrew.

 

Dear Andrew,
I recently had the extraction problem with RCX, giving higher extracted parameters in the device. But however, I noticed the extracted and the schematic designs match better if the option "Extract MOS diffusion AP" is selected. Your thoughts on this are welcome.

Regards,

Jagadish.