V
Veek M
Guest
In this MOSFET, when we apply a +ve voltage to the Gate, we repel holes as
the majority charge carrier in the p-type substrate downwards, thus
uncovering fixed acceptor ions/atoms which are now negativly charged
(electrons in the substrate are drawn to this region under the Gate).
We thus create a layer of fixed negative ions (a acceptor atom with a
electron) and Sedra calls this newly formed structure a n-type inversion
layer.
But in n-type materials we normally have fixed donor atoms that have donated
an electron and are now +ve ions.
So..
n-type == '+ve dopant ion, plenty of e'
inversion == '-ve dopant ion'
What am I interpreting incorrectly?
the majority charge carrier in the p-type substrate downwards, thus
uncovering fixed acceptor ions/atoms which are now negativly charged
(electrons in the substrate are drawn to this region under the Gate).
We thus create a layer of fixed negative ions (a acceptor atom with a
electron) and Sedra calls this newly formed structure a n-type inversion
layer.
But in n-type materials we normally have fixed donor atoms that have donated
an electron and are now +ve ions.
So..
n-type == '+ve dopant ion, plenty of e'
inversion == '-ve dopant ion'
What am I interpreting incorrectly?